News


23.05.19

New publication: "Temperature dependent ambipolar charge carrier mobility in large crystal hybrid halide perovskite thin films", Alexander Biewald, Nadja Giesbrecht, Thomas Bein, Pablo Docampo, Achin Hartschuh and Richard Ciesielski

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07.03.19

New publication: "Tip-Enhanced Spectroscopy and Imaging of Carbon Nanomaterials", by Ado Jorio, Luiz Gustavo Cançado, Sebastian Heeg, Lukas Novotny and Achim Hartschuh (Dedicated to the Memory of Professor Mildred S Dresselhaus)

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04.03.19

New publication: "Freely Suspended, van der Waals Bound Organic Nanometer‐Thin Functional Films: Mechanical and Electronic Characterization", Lilian S. Schaffroth, Jakob Lenz, Veit Giegold, Maximilian Kögl, Achim Hartschuh and R. Thomas Weitz

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11.12.18

New Publication: "Efficient Hotspot Switching in Plasmonic Nanoantennas using Phase-shaped Laser Pulses controlled by Neural Networks", Alberto Comin and Achim Hartschuh,

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Address


Ludwig-Maximilians-
Universitaet Muenchen
Department Chemie
Butenandtstr. 5-11 (Haus E, Gerhard-Ertl-Gebaeude)
81377 Muenchen

Phone: +49 89 2180 77515
Mail: Prof. A. Hartschuh
 
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Controlling near-field optical intensities by polarization pulse shaping

We carry out numerical simulations on a series of progressively more complex metallic nanoparticle systems to explore in detail the mechanisms of control. We find that an essential element for the controllability of intensity localization is the spatial variation of the phase in the near-field that is due either to the interference between the plane incident wave and the near-field of the nano-system or to the interference of fields generated by different parts of the nano-system.

This work is supported by the DFG through HA4405/6-1 "Adaptive control of tip-enhanced near-field optical signals in carbon nanotubes" that is part of SPP 1391 "Ultrafast Nanooptics".

Configuration of nanoparticle and incident fields. In the plane z = 0
the intensity distribution for the y-component of the field resulting from the
shaped input field that maximizes the E-field at point x = −4 nm, y = −4 nm
is shown (the control point is marked in the graph with a black star.)
A genetic algorithm has been used for pulse optimization.
The direction of propagation of the field k is also shown.

 

[1] H. Fielding, M. Shapiro, T. Baumert, J. Phys. B At.Mol. Opt. 41, 70201 (2008).